The Applied VeritySEM 2 Metrology system offers unparalleled precision and maximum production throughput, measuring 45nm gate, low-k, and ArF resist features with 3Å accuracy, essential for 45nm device production. Enhanced by its advanced automation, this system drastically reduces the need for tool operators and cuts down on CD-SEM tools in fabs. A standout feature, the OPC Check, automates the Optical Proximity Correction mask qualification, catering to evolving chipmaker needs. Proprietary SEM technology ensures speedy electron movement and precise measurements, resulting in top-notch resolution.

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

VeritySEM 2

The CG4000 is a cutting-edge solution for process applications, offering advanced functions that enhance both precision and efficiency. Its high-accuracy averaged CD (ACD) metrology function improves repeatability and throughput, while its industry-standard line edge roughness (LER) measurement function contributes significantly to process monitoring. These features make the CG4000 an essential tool for maintaining high standards in process applications.

Hitachi High-Tech offers a range of advanced industrial equipment solutions for assembly and processing machines used in the production of lithium batteries, auto parts and advanced film. Also offered R&D equipment necessary for the development of FC, organic materials, and catalyst materials.

HITACHI

CG4000

The electron optical system of the Model S-9260 CD-SEM has a 3-nm image resolution, which is applicable to lines/spaces and hole patterns of less than
0.1 µm. Figs. 2 and 3 show examples of observations of the model. It has formula-editor and beam-tilt observation functions
that enable detecting process variations early and controlling them easily.

S-9260A

S-7840 review SEM has been incorporated with (1) ADR (automatic defect review) and ADC (automatic defect classification), (2) data interface with various inspection equipment, (3) an interface which transfers review results with SEM images showing the defects to an advanced data analysis system, and (4) defect sampling function which allows selection of type of defects for reviewing.

CD SEM

개요

서비스

CD SEM의 제조업체들

CD SEM의 상위 제품들

VeritySEM 2

15 등재물

CG4000

12 등재물

S-9260A

5 등재물

S-7840

5 등재물