설명
ECD (Electro Chemical Deposition)환경 설정
환경 설정 없음OEM 모델 설명
The Raider™ ECD is a fourth-generation single wafer electrochemical deposition tool that delivers advanced metal processing in a small footprint. It is an automated, multi-process tool that is available with cluster modules for metrology, plating, and cleaning. The Raider™ incorporates programmable reactors and can provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to provide advanced metal processing capabilities in a compact and efficient package.문서
문서 없음
APPLIED MATERIALS (AMAT) / SEMITOOL
RAIDER ECD
검증됨
카테고리
Electro Plating
마지막 검증일: 22일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
117877
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기APPLIED MATERIALS (AMAT) / SEMITOOL
RAIDER ECD
카테고리
Electro Plating
마지막 검증일: 22일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
117877
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
ECD (Electro Chemical Deposition)환경 설정
환경 설정 없음OEM 모델 설명
The Raider™ ECD is a fourth-generation single wafer electrochemical deposition tool that delivers advanced metal processing in a small footprint. It is an automated, multi-process tool that is available with cluster modules for metrology, plating, and cleaning. The Raider™ incorporates programmable reactors and can provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to provide advanced metal processing capabilities in a compact and efficient package.문서
문서 없음