ZEISS MeRiT neXT tool is the industry standard for high-end photomask repairs. By using ZEISS electron beam column, it enables the repair of smallest defects on many different types of photomasks. Clear and opaque defects can be repaired based on exposure with focused electron beams and adsorption of precursor molecules. It features a minimum repair size of 15nm. MeRiT® neXT systems are currently employed in mask shops all over the world to repair all kinds of standard DUV and EUV photomasks down to 7nm technology node.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

ZEISS / CARL ZEISS

MeRiT neXT

LM710A

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

ALTA 4300

EUV repair results by ZEISS MeRiT LE High-end repair on a EUV photomask performed with a MeRiT® LE. Shown tiny extrusion repair reflects future technology nodes of 5nm node and beyond. Repair has been verified by using AIMS® EUV measurements. 

Photomask

개요

서비스

Photomask의 제조업체들

Photomask의 상위 제품들

MeRiT neXT

LM710A

ALTA 4300

MeRiT LE