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XT1700Fi_Packing listxlsx.xlsx

ASML XT1700 LENS Data_1.docx

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

ASML

The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.