설명
Nikon NSR-S204B Wafer DUV Scanner환경 설정
Laser Scanner Cymer: ELS-6400, Vintage:2001.08.09 KrF ScannerOEM 모델 설명
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.문서
문서 없음
NIKON
NSR-S204B
검증됨
카테고리
248nm DUV
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled / Uncrated
제품 ID:
93138
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
NIKON
NSR-S204B
카테고리
248nm DUV
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled / Uncrated
제품 ID:
93138
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Nikon NSR-S204B Wafer DUV Scanner환경 설정
Laser Scanner Cymer: ELS-6400, Vintage:2001.08.09 KrF ScannerOEM 모델 설명
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.문서
문서 없음