DCG-200Z	

EDGE30R40A

EDGE 210R40A-G12

EDGE 6060A-G12

OEM-650A	

FI20162-1	

AX7657-2	

AX3063	

DCS80-13E

649A21T11CAFR-S

GEW-3540	

FI20612

D13449	

GHW-85A	

GHW-12Z	

113BJ1-P

Remote Plasma Source for On-Wafer Processing

AX7690

OEM-6AM-1B	

NW 100

AX3151	

MWH-100-01M6

OEM-12	

The GHW25 13.56 MHz, 2.5 kW, RF Plasma Generator is available with Auto-Frequency Tuning for fixed matching networks, resulting in faster tuning and lower system cost. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.

GHW-25

ASTRONex	

OEM-25	

GHW-50Z	

GL-139	

LIQUOZON XF L13

FI20608

PC-3G

OEM-25G

AX9004	

FI20160-1	

AX7700-10

PVS-6

AX3063ULVJ	

FI20609	

PR 4000

AX7650	

626C13TDE

626A21TDE

B-3013	

AX7700-11

OEM-6A-01	

647B

AX3060-1	

DSS CW2 V2	

OEM-25A	

AX8559

The GHW12 13.56 MHz, 1.25 kW, RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC. GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices. All MKS Instruments' RF Generators are NRTL certified and CE marked.

GHW-50

247C

VODMC33CR1BE

TMP-H3153LMC

The MKS Type 649 is a single instrument that provides both pressure control and flow metering. The Type 649 replaces multiple component subassemblies, for example pressure controllers with separate flow meters used in applications such as backside wafer cooling systems (BWCS). The compact Type 649 design allows for significant reduction in BWCS size and complexity.

649A

647B4RLTE

SRG3-EL

AX8555

Integrated remote plasma source AX7695 - on wafer processing, higher flow rates, lowest cost “clean” source of atomic radicals.

R*evolution III

B-5002-12054	

647B4R0TE

The AX8407 SEMOZON® is a high concentration, ultra-clean ozone generator. Through design enhancements, SEMOZON® AX8407 extends the capability of patented MKS cell technology and production-proven design providing the highest performance for its size. AX8407 is the highest purity ozone generator on the market. It converts pure oxygen into ozone through silent electrical discharge and achieves the highest output concentration levels available. It requires only minute levels of dopant nitrogen gas, far below the levels required for competitive ozone generators. As a result, the ozone is ultra-clean and the presence of contaminants, e.g. NOx compounds, is extremely low. Ozone is an environmentally friendly alternative to many chemical processes. It has a high redox potential, can be generated at the point of use and is easily converted back to oxygen. Typical semiconductor ozone applications include TEOS/Ozone CVD, Ta2O5 CVD, photoresist strip, wafer cleaning, contaminant removal, surface conditioning, oxide growth, and ALD. Ozone is also ideally suited for use in pharmaceutical and water processing applications including cleaning, sterilization and disinfection, as well as Clean-In-Place (CIP).



AX8407

SEMOZON AX8560

AX8403

EDGE6513A

LIQUOZONE PRIMO3

626C.01

The NOVA®-25A 2.5 kW, 2 MHz RF Plasma Generator offers advanced RF plasma generation and control for low cost and high yield in the most demanding thin film processing applications. NOVA RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

NOVA-25A

GHW-12

D103

AX8560

CIRRUS2

PAS 

AX7690PSK-04

Remote Plasma Source combines field-proven, low-field toroidal plasma technology with an actively cooled plasma chamber made of high purity quartz, significantly reducing oxygen, hydrogen and nitrogen atomic gas loss through wall recombination.

R*evolution

PDR-C-1C	

OEM-25XL	

Welcome to the future of mass spectrometer-based helium leak detection. Weighing 17 lbs., the PICO is truly the smallest mass spectrometer-based leak detector available in the world today. Incorporating advanced technology in mass spectrometry and vacuum technology (patents pending), the PICO provides fast, contamination-free, leak detection. As a vacuum style helium leak detector, the PICO can be quickly and easily transported to the vacuum system to be leak tested without the need for bulky transport carts. In addition to an ion trap mass spectrometer, the PICO has an integral vacuum system which incorporates a turbomolecular pump as well as a backing scroll pump. Aided by the small volumes of the unit, the PICO has a very fast response and clean-up time. The PICO incorporates a removable handheld remote display with 15 ft. of interconnecting cable. The user interface is self-intuitive and very simple to use. The helium leak rate is displayed in numeric, bar graph, and historical trending formats. The remote display also incorporates an audio alarm which can be heard in very noisy environments, often encountered in leak detection applications. The PICO also includes self-protection circuitry that protects the integral turbomolecular pump from situations which would normally damage the turbo pump and require significant repair. The unit also includes a "zero" feature that compensates for background levels of helium often encountered in leak detection applications.

PICO

ASTEX AX 8500

The NOVA®-50A 5.0 kW 2 MHz RF Plasma Generator is ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications. NOVA RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.

NOVA-50A

OEM-12B-06	

FS-100

MKS

개요

활성 등재물

총 제품 수

서비스

상위 제품

DCG-200Z

EDGE30R40A

EDGE 210R40A-G12

EDGE 6060A-G12

Moov에 등재하고 즉시 완벽한 구매자를 찾으십시오.

모든 제품

모든 등재물 보기