Includes as standard:

Apollo III reactor radially designed plenum
Genmark 3-Axis pick and place robot
System controller (includes Pentium computer and touch screen interface)
Inductively coupled plasma source with 1250 watt 13.56 MHz RF generator
One each mass flow controller (O2) (Expansion available to three total MFC's)
Temperature control of bottom electrode from 50C to 250C
Automatic pressure control
Optical endpoint detection system
Additional monitor and VGA port
60 cfm non-corrosive dry pump; Ebara S20P
Emergency Off and AC distribution
Installation for maintenance and operator
12 Month service warranty (includes parts and labor)
Options:

Recirculating temperature controller (SMC HRS012-AN-20)
Custom end effector (heated with custom vacuum configuration)
Additional Optical endpoint detection system for O2 plasma process and installation
Integration of RS-232 Barcode Scanner to system computer
ICP Matching Network presets
Software Version: Apollo_2.51_Bld3
Note: Wafer Size Configured To: 100 mm; Wafer Size Capacity: 300 mm

Trion Technology, Inc. manufacturers a wide variety of Plasma Etch and Deposition Systems for the Failure Analysis, Compound Semiconductor, MEMS, Opto-Electronic, Photovoltaic, and Research markets.

TRION

APOLLO III

Ashers / Plasma Cleaner

유사 등재물

APOLLO III

Ashers / Plasma Cleaner

유사 등재물