설명
CD SEM환경 설정
NT Platform System Computer Dell Precision Work Station (Dual Core Processor) Raid Array (2 drive) OS – Windows NT 4.0 Main System Application – 6.1.SR2+ 3 Cassette Stations – Wafer 4” 5” 6” 8” Capable PRI Robot (with Class 1 wafer scanner) and Prealigner Electron Column – E Column Electron Source – Refurbished Scintillator Detector – New Energy Filter – Refurbished Wein Filter Apertures (2 each) – New Quick Pump (Optional)OEM 모델 설명
The KLA-Tencor 8100XP CD SEM is a state-of-the-art scanning electron microscope used in semiconductor manufacturing. It enables precise and fast measurements of critical dimensions (CD) in small device geometries. The CD SEM has advanced capabilities for imaging and measuring high aspect ratio features, ensuring optimum device performance. It offers productivity-enhancing features such as high throughput, networking, offline recipe setup, and full system automation.문서
문서 없음
KLA
8100XP
검증됨
카테고리
CD-SEM
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
49393
웨이퍼 사이즈:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
8100XP
카테고리
CD-SEM
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
49393
웨이퍼 사이즈:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
빈티지:
1998
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
CD SEM환경 설정
NT Platform System Computer Dell Precision Work Station (Dual Core Processor) Raid Array (2 drive) OS – Windows NT 4.0 Main System Application – 6.1.SR2+ 3 Cassette Stations – Wafer 4” 5” 6” 8” Capable PRI Robot (with Class 1 wafer scanner) and Prealigner Electron Column – E Column Electron Source – Refurbished Scintillator Detector – New Energy Filter – Refurbished Wein Filter Apertures (2 each) – New Quick Pump (Optional)OEM 모델 설명
The KLA-Tencor 8100XP CD SEM is a state-of-the-art scanning electron microscope used in semiconductor manufacturing. It enables precise and fast measurements of critical dimensions (CD) in small device geometries. The CD SEM has advanced capabilities for imaging and measuring high aspect ratio features, ensuring optimum device performance. It offers productivity-enhancing features such as high throughput, networking, offline recipe setup, and full system automation.문서
문서 없음