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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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APPLIED MATERIALS (AMAT) REFLEXION LK
    설명
    Dielectric CMP
    환경 설정
    Oxide
    OEM 모델 설명
    The integrated post-CMP Desica® cleaner uses unique full-immersion Marangoni® vapor drying technology to virtually eliminate watermark defects and dramatically reduce particle contamination. The wafer is so clean after CMP (<100 45nm defects on a 300mm wafer) that compared to the entire surface area of the earth, the remaining contaminants would cover only 0.3 acres, the size of a medium sized suburban garden The Applied Reflexion LK CMP system also implements a full suite of endpoint methods, in-line metrology and advanced process control capabilities that ensure excellent within-wafer and wafer-to-wafer process control and repeatability for all planarization applications. Its patented window-in-pad technology enables accurate real-time polish control of every wafer without compromising throughput. The new FullVision™ in-situ endpoint system, for all stop-in and stop-on dielectric applications, uses broadband spectroscopy to significantly improve Cpk and minimize wafer scrap caused by drifts in consumable sets and incoming wafer variations.
    문서

    문서 없음

    APPLIED MATERIALS (AMAT)

    REFLEXION LK

    verified-listing-icon

    검증됨

    카테고리
    CMP

    마지막 검증일: 6일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    62604


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) REFLEXION LK

    APPLIED MATERIALS (AMAT)

    REFLEXION LK

    CMP
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    APPLIED MATERIALS (AMAT)

    REFLEXION LK

    verified-listing-icon
    검증됨
    카테고리
    CMP
    마지막 검증일: 6일 전
    listing-photo-6f147613cdb84e9da32042b0523aca75-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    62604


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Dielectric CMP
    환경 설정
    Oxide
    OEM 모델 설명
    The integrated post-CMP Desica® cleaner uses unique full-immersion Marangoni® vapor drying technology to virtually eliminate watermark defects and dramatically reduce particle contamination. The wafer is so clean after CMP (<100 45nm defects on a 300mm wafer) that compared to the entire surface area of the earth, the remaining contaminants would cover only 0.3 acres, the size of a medium sized suburban garden The Applied Reflexion LK CMP system also implements a full suite of endpoint methods, in-line metrology and advanced process control capabilities that ensure excellent within-wafer and wafer-to-wafer process control and repeatability for all planarization applications. Its patented window-in-pad technology enables accurate real-time polish control of every wafer without compromising throughput. The new FullVision™ in-situ endpoint system, for all stop-in and stop-on dielectric applications, uses broadband spectroscopy to significantly improve Cpk and minimize wafer scrap caused by drifts in consumable sets and incoming wafer variations.
    문서

    문서 없음

    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) REFLEXION LK

    APPLIED MATERIALS (AMAT)

    REFLEXION LK

    CMP빈티지: 0조건: 중고마지막 검증일:60일 이상 전
    APPLIED MATERIALS (AMAT) REFLEXION LK

    APPLIED MATERIALS (AMAT)

    REFLEXION LK

    CMP빈티지: 0조건: 중고마지막 검증일:6일 전
    APPLIED MATERIALS (AMAT) REFLEXION LK

    APPLIED MATERIALS (AMAT)

    REFLEXION LK

    CMP빈티지: 0조건: 중고마지막 검증일:6일 전