설명
WCVD (Chemical Vapor Deposition)환경 설정
환경 설정 없음OEM 모델 설명
The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.문서
문서 없음
LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS MAX
검증됨
카테고리
CVD (Metalization)
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
18404
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS MAX
검증됨
카테고리
CVD (Metalization)
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
18404
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
WCVD (Chemical Vapor Deposition)환경 설정
환경 설정 없음OEM 모델 설명
The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.문서
문서 없음