메인 콘텐츠로 건너뛰기
Moov logo

Moov Icon
APPLIED MATERIALS (AMAT) P5000 CVD
    설명
    설명 없음
    환경 설정
    CVD Chamber and DXZ Chamber
    OEM 모델 설명
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    문서

    문서 없음

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon

    검증됨

    카테고리

    CVD
    마지막 검증일: 60일 이상 전
    주요 품목 세부 정보

    조건:

    Parts Tool


    작동 상태:

    알 수 없음


    제품 ID:

    90250


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)P5000 CVDCVD
    빈티지: 0조건: 중고
    마지막 검증일10일 전

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon

    검증됨

    카테고리

    CVD
    마지막 검증일: 60일 이상 전
    listing-photo-8a014555585a4fc59ec364546c6a8c32-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2028/90250/85365db8b68c4272a4d5c3baa17fd7f4_c066dfef6ea6461c89f6eb251e0c9793unnamed1_mw.jpg
    주요 품목 세부 정보

    조건:

    Parts Tool


    작동 상태:

    알 수 없음


    제품 ID:

    90250


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    CVD Chamber and DXZ Chamber
    OEM 모델 설명
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    문서

    문서 없음

    유사 등재물
    모두 보기
    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)
    P5000 CVD
    CVD빈티지: 0조건: 중고마지막 검증일: 10일 전
    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)
    P5000 CVD
    CVD빈티지: 0조건: 중고마지막 검증일: 10일 전
    APPLIED MATERIALS (AMAT) P5000 CVD
    APPLIED MATERIALS (AMAT)
    P5000 CVD
    CVD빈티지: 0조건: 중고마지막 검증일: 12일 전