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APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
  • APPLIED MATERIALS (AMAT) P5000 CVD
설명
Applied Materials standard 4-6" CVD chamber. Can be used for Teos and Nitride CVD
환경 설정
Configured for P-5000 chamber A position Where used: 0010-10327 0226-30332 0010-76270 0100-09022 0100-09123 0100-09123 0090-09125 0040-09817 0020-34731 0200-35007 0020-26158 0190-09272 0010-09263 0100-09246 0100-00149 0100-20147 0021-39570 0021-03488 0040-21897 0240-31632 0010-09982 0010-70074 0660-01592 0021-10602 0660-01592 0150-76037 0190-40045 0100-09010 0200-35256 0010-09174 0010-35502 0100-20098 0100-20098 0100-20098 0010-02991 0100-35230 0200-35671 0020-20586 0200-35208 0200-35693 0200-35693 0200-36679 0100-00014 0020-34299 0010-00685 0021-36198 0200-01225 0100-00008 0100-09010 0010-09843 0040-39077
OEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
문서

문서 없음

PREFERRED
 
SELLER
카테고리
CVD

마지막 검증일: 60일 이상 전

Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

Installed / Idle


제품 ID:

60923


웨이퍼 사이즈:

4"/100mm, 6"/150mm


Chamber Processes:
CVD

빈티지:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
PREFERRED
 
SELLER

APPLIED MATERIALS (AMAT)

P5000 CVD

verified-listing-icon
검증됨
카테고리
CVD
마지막 검증일: 60일 이상 전
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/0b96ab79d09f42e1a078d0a0980c712f_71d7309493344d358616a40514eef0541201a_mw.jpeg
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/399770369fcb4ce7a084fc5a5053d822_b273bdbb7a9f4ae083da794a52b852231201a_mw.jpeg
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/dbcc377f784845499962eae1badbb336_f784b4da46b84a96a155be2ea0849f99_mw.jpeg
listing-photo-8c228e7c3b2248cb808b36e08314697e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45354/8c228e7c3b2248cb808b36e08314697e/a7c61065df2542238c97b0811e686e81_de7f51bdc3854e87a345bf6c8182d2ba1201a_mw.jpeg
Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

Installed / Idle


제품 ID:

60923


웨이퍼 사이즈:

4"/100mm, 6"/150mm


Chamber Processes:
CVD

빈티지:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Applied Materials standard 4-6" CVD chamber. Can be used for Teos and Nitride CVD
환경 설정
Configured for P-5000 chamber A position Where used: 0010-10327 0226-30332 0010-76270 0100-09022 0100-09123 0100-09123 0090-09125 0040-09817 0020-34731 0200-35007 0020-26158 0190-09272 0010-09263 0100-09246 0100-00149 0100-20147 0021-39570 0021-03488 0040-21897 0240-31632 0010-09982 0010-70074 0660-01592 0021-10602 0660-01592 0150-76037 0190-40045 0100-09010 0200-35256 0010-09174 0010-35502 0100-20098 0100-20098 0100-20098 0010-02991 0100-35230 0200-35671 0020-20586 0200-35208 0200-35693 0200-35693 0200-36679 0100-00014 0020-34299 0010-00685 0021-36198 0200-01225 0100-00008 0100-09010 0010-09843 0040-39077
OEM 모델 설명
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
문서

문서 없음

유사 등재물
모두 보기