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KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
  • KLA CANDELA OSA-6100
설명
설명 없음
환경 설정
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEM 모델 설명
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
문서

문서 없음

카테고리
Defect Inspection

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Refurbished


작동 상태:

알 수 없음


제품 ID:

101992


웨이퍼 사이즈:

6"/150mm


빈티지:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

CANDELA OSA-6100

verified-listing-icon
검증됨
카테고리
Defect Inspection
마지막 검증일: 60일 이상 전
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/1c8a2b6d370b4e1e924015956d108fe7_2_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/be51dfbbef7d4b6fb5f28e4ea7efa111_1_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/485ae4d985684bc3a9bda518effa6a2f_4_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/7bf686ce73dc442696cbdb6f62d15783_spk3632_mw.jpg
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/5c44323dce4c44c79036257d84eefc90_3_mw.png
listing-photo-c1e2d332b9b742cf85b7cd227fc37d75-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c1e2d332b9b742cf85b7cd227fc37d75/10b7fd1f006847c59fad2da85a59a40e_spk3633_mw.jpg
주요 품목 세부 정보

조건:

Refurbished


작동 상태:

알 수 없음


제품 ID:

101992


웨이퍼 사이즈:

6"/150mm


빈티지:

2005


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
Optical Defect Inspection Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Interface : Trackball and keyboard standard Substrate Thickness : 350 μm ~ 1,100 μm Substrate Material : Any clear or opaque polished surface [ Performance ] Defect Sensitivity 0.08 μm diameter PSL sphere equivalent > 95% capture rate(PSL on bare Si) Other Defects and Applications : Particles, scratches, stains, pits, and bumps. Sensitivity: Minimum detectable size for automatic defect classification: - Scratches: 100 μm long, 0.1 μm wide, 50 Å;; deep. - Pits: 20 μm diameter, 50 Å;; deep - Stains: 20 μm diameter, 10 Å;; thick [ Application ] - Disk substrates
OEM 모델 설명
The Candela OSA 6100 is a system that introduces X-Beam channel technology, which adds radial illumination to the existing circumferential illumination design. It also features advanced collection optics that extend defect sensitivity down to 80nm. This multi-channel system is capable of simultaneously detecting and classifying defects such as particles, pits, and stains. Additionally, it can characterize lubricant thickness and use the Kerr Effect to characterize magnetic imaging.
문서

문서 없음