메인 콘텐츠로 건너뛰기

SL301

카테고리
Defect Inspection
개요

For SL301, the STARlight HR (High Resolution) option is available as a factory or field upgrade. It uses the smallest pixel size available in any contamination inspection system to deliver the inspection sensitivity required for 0.25-m lithography. This feature will help increase the lithography process window for both mask shops and wafer fabs by capturing contaminants and particles, even semi-transparent defects, such as stains and transmission errors before they impact wafer production.

활성 등재물

0

서비스

검사, 보험, 감정, 물류

상위 등재물

    제품을 찾을 수 없음
이런 제품이 있으신가요?
Moov에 등재하고 즉시 완벽한 구매자를 찾으십시오.