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LMS IPRO6
개요
The LMS IPRO6 system is used by mask shops for comprehensive characterization of reticle pattern placement error, which is a direct contributor to wafer-level pattern overlay error. The LMS IPRO6 utilizes model-based metrology to accurately measure reticle registration for on-device pattern features and standard registration marks, producing higher sampling for better determination of mask quality.
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
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