CONCEPT THREE "C3" ALTUS
카테고리
Deposition개요
Concept Three ALTUS is a 300mm process module that delivers leading productivity and technology for contact and local interconnect applications. It uses Pulsed Nucleation Layer (PNL™) technology to integrate a high throughput nucleation layer with chemical vapor deposition (CVD bulk deposition). The Multi-Station Sequential Deposition (MSSD) architecture enables the nucleation layer and CVD fill to be performed within the same ALTUS chamber. This results in highly conformal tungsten films with improved film properties, benchmark productivity, and superior production availability. The integrated PNL and CVD approach produces the lowest Cost of Ownership tungsten deposition solution in the industry.
활성 등재물
4
서비스
검사, 보험, 감정, 물류
상위 등재물
LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS
Deposition빈티지: 2006조건: 중고마지막 검증일60일 이상 전LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS
Deposition빈티지: 2005조건: 중고마지막 검증일60일 이상 전LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS
Deposition빈티지: 2007조건: 중고마지막 검증일60일 이상 전LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS
Deposition빈티지: 조건: 중고마지막 검증일60일 이상 전