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M6000L

카테고리
Dry Etch
개요

The M6000L combines exceptional process capability and yield in a single wafer system that prevents waste metal redeposition that is often a problem for traditional batch processes. Its compact footprint, approximately 1200 mm by 1200 mm, low chemical consumption, and potential for high process material utilization reduces cost of ownership even further for metal lift-off processes.

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