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APPLIED MATERIALS (AMAT) CENTURA DPS
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    The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).
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    SELLER
    카테고리
    Dry / Plasma Etch

    마지막 검증일: 60일 이상 전

    Buyer pays 12% premium of final sale price
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    108848


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2007


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    유사 등재물
    모두 보기
    PREFERRED
     
    SELLER

    APPLIED MATERIALS (AMAT)

    CENTURA DPS

    verified-listing-icon
    검증됨
    카테고리
    Dry / Plasma Etch
    마지막 검증일: 60일 이상 전
    listing-photo-8f26c6e7440c4de7b74533323121d010-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Buyer pays 12% premium of final sale price
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    108848


    웨이퍼 사이즈:

    12"/300mm


    빈티지:

    2007


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    설명 없음
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The AMAT Centura DPS is a highly efficient semiconductor processing system with a unique architecture that groups four processing stations and two auxiliary chambers around a central transfer module housing an ultra-reliable magnetically-coupled vacuum robot. It is designed for ≤200mm wafer fabrication and supports various applications such as Chemical Vapor Deposition (CVD), epitaxy, etch, plasma nitridation, and Rapid Thermal Processing (RTP).
    문서

    문서 없음

    유사 등재물
    모두 보기