CENTURA RPS
개요
The Remote Plasma Source (RPS) Centura, introduced in June 1995, extended the AMAT range of dielectric dry etch process technologies to several isotropic etch steps.
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검사, 보험, 감정, 물류
상위 등재물
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The Remote Plasma Source (RPS) Centura, introduced in June 1995, extended the AMAT range of dielectric dry etch process technologies to several isotropic etch steps.
0
검사, 보험, 감정, 물류