설명
CVD Chemical Vapor Deposition환경 설정
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 모델 설명
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.문서
문서 없음
MATTSON
ASPEN II
검증됨
카테고리
Dry / Plasma Etch
마지막 검증일: 30일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
66491
웨이퍼 사이즈:
6"/150mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
MATTSON
ASPEN II
카테고리
Dry / Plasma Etch
마지막 검증일: 30일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
66491
웨이퍼 사이즈:
6"/150mm
빈티지:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
CVD Chemical Vapor Deposition환경 설정
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM 모델 설명
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.문서
문서 없음