설명
설명 없음환경 설정
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEM 모델 설명
Etching System문서
문서 없음
OXFORD
100 180 ICP
검증됨
카테고리
Dry / Plasma Etch
마지막 검증일: 30일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
113484
웨이퍼 사이즈:
8"/200mm
빈티지:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
100 180 ICP
카테고리
Dry / Plasma Etch
마지막 검증일: 30일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
Deinstalled
제품 ID:
113484
웨이퍼 사이즈:
8"/200mm
빈티지:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Model: Plasmalab 100 ICP - Inductive Coupled Plasma Source (ICP380) - Max wafer size: 8"/200m diameter (8" platen) - X-20 PLC Controller - New Windows 10 PC - Cryo Table Option Equipped (-150C to +400C) - Mechanical Wafer Clamping - Backside Helium Cooling - Load-locked single chamber (ICP) - Alcatel Maglev Turbo Pump (Chamber) - Alcatel Turbo Pump (Load Lock) - Alcatel ACT Controller - Computer (see note below) - LCD Monitor, Keyboard, and Mouse - Load Lock Rough Pump - Chamber Rough PumpOEM 모델 설명
Etching System문서
문서 없음