설명
Generation 3환경 설정
3rd Generation - G3 Zeta - Software operational meaning cpu boots up - 1 console with qty 4 canisters - 300mm table - FDM - PM - Power Distribution pannelOEM 모델 설명
The ZETA Surface Conditioning System is a fully automated centrifugal spray processor designed for advanced, batch cleaning, etching and stripping applications on 200-mm and 300-mm wafers. The system is completely closed, providing greater process control and repeatability in an extremely clean environment. Compared to traditional wet cleaning technologies, the ZETA system uses less fab space and chemicals and operates at a much lower cost. It performs a variety of etching applications, including patterned aluminum etch/strip, wafer reclaim, oxide etch/strip, and polysilicon deglaze.문서
문서 없음
TEL / FSI
ZETA
검증됨
카테고리
Etch/Asher
마지막 검증일: 15일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
12620
웨이퍼 사이즈:
8"/200mm, 12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
TEL / FSI
ZETA
카테고리
Etch/Asher
마지막 검증일: 15일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
12620
웨이퍼 사이즈:
8"/200mm, 12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Generation 3환경 설정
3rd Generation - G3 Zeta - Software operational meaning cpu boots up - 1 console with qty 4 canisters - 300mm table - FDM - PM - Power Distribution pannelOEM 모델 설명
The ZETA Surface Conditioning System is a fully automated centrifugal spray processor designed for advanced, batch cleaning, etching and stripping applications on 200-mm and 300-mm wafers. The system is completely closed, providing greater process control and repeatability in an extremely clean environment. Compared to traditional wet cleaning technologies, the ZETA system uses less fab space and chemicals and operates at a much lower cost. It performs a variety of etching applications, including patterned aluminum etch/strip, wafer reclaim, oxide etch/strip, and polysilicon deglaze.문서
문서 없음
유사 등재물
모두 보기유사 등재물 없음