설명
Wafer Edge Cleaning - Plasma환경 설정
환경 설정 없음OEM 모델 설명
The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.문서
문서 없음
LAM RESEARCH CORPORATION
2300 CORONUS
검증됨
카테고리
Etch/Asher
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
91745
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
LAM RESEARCH CORPORATION
2300 CORONUS
카테고리
Etch/Asher
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
91745
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Wafer Edge Cleaning - Plasma환경 설정
환경 설정 없음OEM 모델 설명
The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.문서
문서 없음
유사 등재물
모두 보기유사 등재물 없음