CENTURA RPS
카테고리
Dry Etch개요
The Remote Plasma Source (RPS) Centura, introduced in June 1995, extended the AMAT range of dielectric dry etch process technologies to several isotropic etch steps.
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
- 제품을 찾을 수 없음
The Remote Plasma Source (RPS) Centura, introduced in June 1995, extended the AMAT range of dielectric dry etch process technologies to several isotropic etch steps.
0
검사, 보험, 감정, 물류