중고 THERMOFISHER SCIENTIFIC / FEI / PHILLIPS FIB 200 판매

설명

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환경 설정

The FEI FIB 200-S uses the Sidewinder ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication and nanoprototyping and MEMS. • Sidewinder column 500V – 30kV; excellent beam profile and stability • Milling Power: 21nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis, comp-eucentric tilt stage • Full coverage of 80mm diameter • Front door load • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVP

OEM 모델 설명

The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.