설명
설명 없음환경 설정
The FIB 800-M uses Magnum ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Magnum ion column, 5–30kV • Milling Power: 21nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis motorized eucentric tilt stage • Full coverage of 200mm diameter sample • XYZRT: 200 x 200 x 25mm x n x 360° x -15° +60° • 200mm load lock • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVP • Includes installation, operational training and 90day warranty.OEM 모델 설명
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.문서
문서 없음
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 800
검증됨
카테고리
FIB
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
16352
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 800
검증됨
카테고리
FIB
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
16352
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
The FIB 800-M uses Magnum ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Magnum ion column, 5–30kV • Milling Power: 21nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis motorized eucentric tilt stage • Full coverage of 200mm diameter sample • XYZRT: 200 x 200 x 25mm x n x 360° x -15° +60° • 200mm load lock • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVP • Includes installation, operational training and 90day warranty.OEM 모델 설명
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.문서
문서 없음