설명
Tool is still running production.환경 설정
Gas Configuration Gas Type BF3 : SDS PH3 : SDS AsH3 : SDS External Facilities Connections : Ar | N2 Loading Configuration: SMIF Electrical Requirements : 208V / 250A GEM/SECS Interface : Yes SECS II Interface : Yes Energy Range : 80KeV Through Wafer – Wafer on Blade Sensor : Yes Hollow Gripper : Yes PEEK Moving Clips : Yes Ion Source Type : Bernas Plasma Flood System : Standard Source Material Type : Tungsten Arc Chamber Front Plate : Split Graphite Dual Vaporizers : No Post-Acceleration Tube/Turbo Pump : Leybold Process Chamber/Cryopumps : CTI OB10OEM 모델 설명
The Precision Implant xR80 was introduced in October 1995. It features low-energy and a very small system footprint while maintaining high throughput.문서
문서 없음
APPLIED MATERIALS (AMAT)
xR80
검증됨
카테고리
High Current
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
16512
웨이퍼 사이즈:
알 수 없음
빈티지:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
xR80
검증됨
카테고리
High Current
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
16512
웨이퍼 사이즈:
알 수 없음
빈티지:
2014
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Tool is still running production.환경 설정
Gas Configuration Gas Type BF3 : SDS PH3 : SDS AsH3 : SDS External Facilities Connections : Ar | N2 Loading Configuration: SMIF Electrical Requirements : 208V / 250A GEM/SECS Interface : Yes SECS II Interface : Yes Energy Range : 80KeV Through Wafer – Wafer on Blade Sensor : Yes Hollow Gripper : Yes PEEK Moving Clips : Yes Ion Source Type : Bernas Plasma Flood System : Standard Source Material Type : Tungsten Arc Chamber Front Plate : Split Graphite Dual Vaporizers : No Post-Acceleration Tube/Turbo Pump : Leybold Process Chamber/Cryopumps : CTI OB10OEM 모델 설명
The Precision Implant xR80 was introduced in October 1995. It features low-energy and a very small system footprint while maintaining high throughput.문서
문서 없음