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GSD VHE

카테고리
Ion Implantation
개요

The GSD/VHE is a high-energy implanter that is currently the most powerful in the industry. It has an extended energy range of up to 5MeV and features quad implant capability, superior cooling, and medium current performance. This makes it a reliable solution for both manufacturing and research and development applications. It is particularly well-suited for the creation of advanced integrated circuits that require deep twin or triple wells and buried layer structures. One of the key advantages of the GSD/VHE is its unmatched beam purity, which is achieved through the use of patented linear acceleration technology. This results in exceptional productivity and a low cost of ownership. The GSD/VHE is capable of performing 200mm very high energy implantation for logic, memory chips, and FLASH memory chips.

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