설명
설명 없음환경 설정
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEM 모델 설명
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.문서
문서 없음
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
검증됨
카테고리
High Energy
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
24051
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
검증됨
카테고리
High Energy
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
24051
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEM 모델 설명
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.문서
문서 없음
유사 등재물
모두 보기유사 등재물 없음