LEX3-II
카테고리
Ion Implantation개요
LEX3-II high-current ion implanter supporting 300-mm wafers with increased beam current at an extremely low energy.
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
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LEX3-II high-current ion implanter supporting 300-mm wafers with increased beam current at an extremely low energy.
0
검사, 보험, 감정, 물류