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MLA 300

카테고리
Lithography
개요

The MLA 300 features our powerful Maskless Aligner technology that has been specifically adapted to the requirements of high-throughput production applications: You can now employ the unmatched flexibility of maskless lithography in an industrial setting, on wafers with sizes up to 300 x 300 mm2. Lithography no longer depends on a fixed mask, but can dynamically adapt to surface and process variations from previous fabrication steps.

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