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VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
  • VISTEC SB254
설명
E-beam Lithography
환경 설정
• 50 keV beam energy LaB6 gun • High-precision stage featuring a traverse range of 210mm X 210mm • Lambda/1024 (0.6nm) laser interferometer resolution for position measurement • Fully automated Outer Handling System (OHS) to perform Pod-to-Pod (SMIF) substrate handling including pre-alignment of substrates • OHS is equipped with two (2) loadports for up to 150mm wafers, interfaced to an ISO class 4 mini environment which can be prepared for CAR on request (amine filter) • OHS has storage capacity of up to 10 holders (holder library) • Four (4) titanium wafer holders for 10mm wafers equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness and Four titanium holders for 150mm equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness. • OHS to allow automated wafer handling directly from customer wafer carriers via SMIF pods. • High speed variable shape beam and vector scan writing principle • High throughput "write-on-the-fly" working principle • Multi-pass writing • Minimum writing address grid: 1nm • Pattern data storage capacity by a RAID system of 2 Tbyte • Sbvis: visualization software for pattern data formats • Mark Detection Software Package (MDSP) including Image Field Metric
OEM 모델 설명
미제공
문서
PREFERRED
 
SELLER
verified-listing-icon

검증됨

카테고리
Lithography

마지막 검증일: 60일 이상 전

Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

116457


웨이퍼 사이즈:

6"/150mm


빈티지:

2020


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

VISTEC

SB254

verified-listing-icon
검증됨
카테고리
Lithography
마지막 검증일: 60일 이상 전
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Buyer pays 12% premium of final sale price
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

116457


웨이퍼 사이즈:

6"/150mm


빈티지:

2020


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
E-beam Lithography
환경 설정
• 50 keV beam energy LaB6 gun • High-precision stage featuring a traverse range of 210mm X 210mm • Lambda/1024 (0.6nm) laser interferometer resolution for position measurement • Fully automated Outer Handling System (OHS) to perform Pod-to-Pod (SMIF) substrate handling including pre-alignment of substrates • OHS is equipped with two (2) loadports for up to 150mm wafers, interfaced to an ISO class 4 mini environment which can be prepared for CAR on request (amine filter) • OHS has storage capacity of up to 10 holders (holder library) • Four (4) titanium wafer holders for 10mm wafers equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness and Four titanium holders for 150mm equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness. • OHS to allow automated wafer handling directly from customer wafer carriers via SMIF pods. • High speed variable shape beam and vector scan writing principle • High throughput "write-on-the-fly" working principle • Multi-pass writing • Minimum writing address grid: 1nm • Pattern data storage capacity by a RAID system of 2 Tbyte • Sbvis: visualization software for pattern data formats • Mark Detection Software Package (MDSP) including Image Field Metric
OEM 모델 설명
미제공
문서