설명
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace환경 설정
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEM 모델 설명
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.문서
문서 없음
APPLIED MATERIALS (AMAT)
CENTURA SINGEN
검증됨
카테고리
LPCVD Poly
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
알 수 없음
제품 ID:
93181
웨이퍼 사이즈:
알 수 없음
빈티지:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA SINGEN
카테고리
LPCVD Poly
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Parts Tool
작동 상태:
알 수 없음
제품 ID:
93181
웨이퍼 사이즈:
알 수 없음
빈티지:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace환경 설정
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEM 모델 설명
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.문서
문서 없음