설명
TB Manual Mask Aligner환경 설정
Topside Alignment (TSA) Backside Alignment (BSA) Manual Handling Manual Controlled Stage Wafer Size: up to 6"/150mm Objectives: 10x (top and backside) Tooling Tray Uniformity Test Plate EVG 620 offers Proximity, Soft Contact, Hard Contact or Vacuum Contact Exposure Modes Tooling Exchanges are Quick, Simple and can be Performed Within Minutes Lamphouse: 350W Lamphouse (Optional: 500W / 350W or LED Upgrade Upon Request) Exposure Optics: Type C, 350nm - 450nm, Broadband Microsoft Windows based User Interface System PC, Keyboard, Cables PDF Manual for EVG 620OEM 모델 설명
The EVG620 is a versatile tool developed by EV Group (EVG) that serves as both an optical double-side lithography and precision alignment system, specifically designed for wafers up to 100 mm in size. The system is capable of safely handling thick, bowed, or small diameter wafers, providing enhanced flexibility in wafer processing. The EVG620's alignment stage design is a standout feature, delivering highly accurate alignment and exposure results for precise patterning. It is equipped with high-resolution top and bottom side split-field microscopes, ensuring excellent imaging capabilities. The user-friendly interface, based on Windows, streamlines the operation of the EVG620, making it a reliable and efficient tool for various lithography and alignment applications in semiconductor and microelectronics manufacturing.문서
문서 없음
EVGroup (EVG)
EVG620
검증됨
카테고리
Mask Aligner
마지막 검증일: 어제
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
93296
웨이퍼 사이즈:
6"/150mm
빈티지:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기EVGroup (EVG)
EVG620
카테고리
Mask Aligner
마지막 검증일: 어제
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
93296
웨이퍼 사이즈:
6"/150mm
빈티지:
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
TB Manual Mask Aligner환경 설정
Topside Alignment (TSA) Backside Alignment (BSA) Manual Handling Manual Controlled Stage Wafer Size: up to 6"/150mm Objectives: 10x (top and backside) Tooling Tray Uniformity Test Plate EVG 620 offers Proximity, Soft Contact, Hard Contact or Vacuum Contact Exposure Modes Tooling Exchanges are Quick, Simple and can be Performed Within Minutes Lamphouse: 350W Lamphouse (Optional: 500W / 350W or LED Upgrade Upon Request) Exposure Optics: Type C, 350nm - 450nm, Broadband Microsoft Windows based User Interface System PC, Keyboard, Cables PDF Manual for EVG 620OEM 모델 설명
The EVG620 is a versatile tool developed by EV Group (EVG) that serves as both an optical double-side lithography and precision alignment system, specifically designed for wafers up to 100 mm in size. The system is capable of safely handling thick, bowed, or small diameter wafers, providing enhanced flexibility in wafer processing. The EVG620's alignment stage design is a standout feature, delivering highly accurate alignment and exposure results for precise patterning. It is equipped with high-resolution top and bottom side split-field microscopes, ensuring excellent imaging capabilities. The user-friendly interface, based on Windows, streamlines the operation of the EVG620, making it a reliable and efficient tool for various lithography and alignment applications in semiconductor and microelectronics manufacturing.문서
문서 없음