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CANON MPA 600
    설명
    Canon Aligner (Projection)
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Canon MPA-600 FA is a one-to-one projection aligner for 6" wafers. It uses a high intensity Mercury lamp to expose the wafer through a mask plate and a series of mirrors. The wafer scans horizontally through an arc of light at a specified scan speed to expose the light-sensitive positive photoresist that was coated onto the wafer. The Canon MPA-600 FA has a wafer size of 5 or 6 inches and a mask size of 6 or 7 inches square. It uses a projection mirror with a magnification of 1X and an illuminator that is a 2kW super high pressure mercury lamp. The exposure wavelengths used are 365 nm (i-line), 405 nm (h-line), and 436 nm (g-line). The resolution is 2.5 um over the entire 6 inch surface and the depth of focus is more than +/- 6 um at linewidth 1.5 um. The alignment accuracy is 3 sigma, < or = 0.6 um.
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    CANON

    MPA 600

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    검증됨

    카테고리
    Mask Aligner

    마지막 검증일: 60일 이상 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    51097


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음

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    유사 등재물
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    CANON MPA 600

    CANON

    MPA 600

    Mask Aligner
    빈티지: 0조건: 중고
    마지막 검증일60일 이상 전

    CANON

    MPA 600

    verified-listing-icon
    검증됨
    카테고리
    Mask Aligner
    마지막 검증일: 60일 이상 전
    listing-photo-0ce6ebb0185b4d94ba2624f349b434aa-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    51097


    웨이퍼 사이즈:

    알 수 없음


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Canon Aligner (Projection)
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Canon MPA-600 FA is a one-to-one projection aligner for 6" wafers. It uses a high intensity Mercury lamp to expose the wafer through a mask plate and a series of mirrors. The wafer scans horizontally through an arc of light at a specified scan speed to expose the light-sensitive positive photoresist that was coated onto the wafer. The Canon MPA-600 FA has a wafer size of 5 or 6 inches and a mask size of 6 or 7 inches square. It uses a projection mirror with a magnification of 1X and an illuminator that is a 2kW super high pressure mercury lamp. The exposure wavelengths used are 365 nm (i-line), 405 nm (h-line), and 436 nm (g-line). The resolution is 2.5 um over the entire 6 inch surface and the depth of focus is more than +/- 6 um at linewidth 1.5 um. The alignment accuracy is 3 sigma, < or = 0.6 um.
    문서

    문서 없음

    유사 등재물
    모두 보기
    CANON MPA 600

    CANON

    MPA 600

    Mask Aligner빈티지: 0조건: 중고마지막 검증일: 60일 이상 전