설명
-Topside Alignment (TSA) -Backside Alignment (BSA) -Manual Handling -Manual Controlled Stage -Up to 6"/150mm Wafer Capable (with correct tooling) -Objectives (10x top and backside) -Vacuum Chuck for 6” wafers and 4" wafers -Maskholder for 7” Masks and 5" Masks -Mask Load Frames 7” and 5" -Tooling Tray -Uniformity Test Plate -EVG 620 offers Proximity, Soft Contact, Hard Contact or Vacuum Contact Exposure Modes -Tooling Exchanges are Quick, Simple and can be Performed Within Minutes -Lamphouse: 1000W Lamphouse Optional 500W / 350W Or LED Upgrade Upon Request -Exposure Optics: Type C, 350nm - 450nm, Broadband -Microsoft Windows based User Interface -System PC, Keyboard, Cables -PDF Manual for EVG 620환경 설정
환경 설정 없음OEM 모델 설명
The EVG620 is a versatile tool developed by EV Group (EVG) that serves as both an optical double-side lithography and precision alignment system, specifically designed for wafers up to 100 mm in size. The system is capable of safely handling thick, bowed, or small diameter wafers, providing enhanced flexibility in wafer processing. The EVG620's alignment stage design is a standout feature, delivering highly accurate alignment and exposure results for precise patterning. It is equipped with high-resolution top and bottom side split-field microscopes, ensuring excellent imaging capabilities. The user-friendly interface, based on Windows, streamlines the operation of the EVG620, making it a reliable and efficient tool for various lithography and alignment applications in semiconductor and microelectronics manufacturing.문서
문서 없음
EVGroup (EVG)
EVG620
검증됨
카테고리
Mask Aligner
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
25960
웨이퍼 사이즈:
알 수 없음
빈티지:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
EVGroup (EVG)
EVG620
검증됨
카테고리
Mask Aligner
마지막 검증일: 30일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
25960
웨이퍼 사이즈:
알 수 없음
빈티지:
2004
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
-Topside Alignment (TSA) -Backside Alignment (BSA) -Manual Handling -Manual Controlled Stage -Up to 6"/150mm Wafer Capable (with correct tooling) -Objectives (10x top and backside) -Vacuum Chuck for 6” wafers and 4" wafers -Maskholder for 7” Masks and 5" Masks -Mask Load Frames 7” and 5" -Tooling Tray -Uniformity Test Plate -EVG 620 offers Proximity, Soft Contact, Hard Contact or Vacuum Contact Exposure Modes -Tooling Exchanges are Quick, Simple and can be Performed Within Minutes -Lamphouse: 1000W Lamphouse Optional 500W / 350W Or LED Upgrade Upon Request -Exposure Optics: Type C, 350nm - 450nm, Broadband -Microsoft Windows based User Interface -System PC, Keyboard, Cables -PDF Manual for EVG 620환경 설정
환경 설정 없음OEM 모델 설명
The EVG620 is a versatile tool developed by EV Group (EVG) that serves as both an optical double-side lithography and precision alignment system, specifically designed for wafers up to 100 mm in size. The system is capable of safely handling thick, bowed, or small diameter wafers, providing enhanced flexibility in wafer processing. The EVG620's alignment stage design is a standout feature, delivering highly accurate alignment and exposure results for precise patterning. It is equipped with high-resolution top and bottom side split-field microscopes, ensuring excellent imaging capabilities. The user-friendly interface, based on Windows, streamlines the operation of the EVG620, making it a reliable and efficient tool for various lithography and alignment applications in semiconductor and microelectronics manufacturing.문서
문서 없음