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AIXTRON AIX 2600 G3
  • AIXTRON AIX 2600 G3
  • AIXTRON AIX 2600 G3
설명
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환경 설정
Software Version CACE 3.5.0286 PLC 3.64+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths 3 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBD
OEM 모델 설명
미제공
문서

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카테고리
MOCVD

마지막 검증일: 28일 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

125709


웨이퍼 사이즈:

6"/150mm


빈티지:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AIXTRON

AIX 2600 G3

verified-listing-icon
검증됨
카테고리
MOCVD
마지막 검증일: 28일 전
listing-photo-4e41a5572d8340e491df702d8ecaca7b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73774/4e41a5572d8340e491df702d8ecaca7b/0c60866306384cf0b7ffba5f4708de70_d2fdaff3b2eb4a67ab26555f929ebc0b_mw.jpeg
listing-photo-4e41a5572d8340e491df702d8ecaca7b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73774/4e41a5572d8340e491df702d8ecaca7b/5af6663ef72d40d6992303624ad8f4e5_f780ef157b614e148f3ea51d432f4cf3_mw.jpeg
주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

125709


웨이퍼 사이즈:

6"/150mm


빈티지:

2000


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
Software Version CACE 3.5.0286 PLC 3.64+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths 3 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBD
OEM 모델 설명
미제공
문서

문서 없음