LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" ALTUS

설명

No: dry pump, RF rack, pump rack

환경 설정

Novellus Concept Two Altus W-CVD - Nitride - Non Shrink - 1 Chamber standard - 1 Chamber PNL Mod s - Load Type :Standard - Process Module Type: CVD-WS Transfer Module Configuration - DLCM Type: DLCM-3 - Cassette Interface: Platform - Robot Type: Mag7 - Arm Set: Dual Arm - Cool Station: 3-Level - Pressure Guage: MKS 100torr - Throttle Valve: MDV-015 - Throttle Valve Controller: Missing Chamber Configuration - Chamber B CVD: C2-CVD-WS(A) - Chamber C CVD: C2-CVD-WS(A) - Pedestal: 200mm - Throttle Valve: MDVX-100b - Isolation Valve: 14040-PE44-AAL2 - RF Matcher: Trazer, Amu2-1 - RF Generator: AE, RFG 3000 - Gas Configuration: Pm-B - Gas-C Ar 5slpm - Gas-D Ar 20slpm - Gas-E Wf6 500sccm - Gas-1 Ar 5slpm - Gas-8 Ar 10slpm - Gas-4 Ar 10slpm - Gas-9 H2 25slpm - Gas-3 H2 20slpm - Gas-B 5% B2h6/N2 500sccm - Gas-6 C2f6 2slpm - Gas-5 Wf6 500sccm - Gas-7 O2 2slpm - Gas-2 Sih4 250sccm - Mfm1 Ar 1slpm Missing / Repair: - Process/Transfer/LL/Pedestal Pumps - Heater Jackets - New Abatement System - Controllers - Heater Pedestals - Showerheads - Pressure Transducers - 3 Way Pneumatic Valves - 2 Way Pneumatic Valves - Gas Sensors - Shuttle/SMIF Loaders - Throttle Valves - Gate Valves - RF Generator - DLCM System Controller - Power Supplies

OEM 모델 설명

Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.