설명
설명 없음환경 설정
Process: LRW From original tool PO, please inspect to verify Process: 4200-60 CONTACT W DEPSoftware Version: 5.86B150P2System Power Rating : 208 AC 3-PhaseLoading Configuration: 3load port(Brooks) Chm Position 1: C3 ALTUS CHA- Chemicals / Gases Used Ar/SiH4/H2/WF6/NF3/B2H6 Chm Position 2: C3 ALTUS CHB-Chemicals / Gases Used Ar/SiH4/H2/WF6/NF3/B2H6 Facility & InterfaceAltus Module Locations: DualWTS(backbone) Facilities Connection Configuration: Bottom Facilities InstallationRemote Interconnect Cables: 75 feet4 Color Flush Mount Signal Tower: 34-291897-04Factory Automation Interface (Over Head Transport), [E84 AMHS Protocal]: E84 controller 02-321482-00 /E84 cable 03-160683-00WTS Frame: 3 FOUP, IMM, F472 FOUP or 3 FOUP Front End Interface: 3 FOUPFixload FOUP RF ID Reader: READER,RFID,OMRON V640-HS61 27-327806-00Fixload Firmware: Rev 2.9Remote Back End User Interface (Ergotron): 04-346723-00Primary Front End User Interface Position: RightModular Power Distribution, [MPD,DUAL, ALTUS,C3PDP]: 01-296434-03 Front End (backbone)ATM Robot Kit (Traverser, Robot, Controller), [Reliance]: Traverser 02-320123-00/Robot 02-343723-00/Controller 02-343877-00ATM Robot Firmware (for friction end effector): 1.47ATM Robot End Effector (Friction Type): 15-360099-01Transfer Module Robot With Leapfrong Armset, [Mag7]: DRIVE UNIT 27-355276-00/Arm set 63-263892-00Transfer Module to Chamber Valve (SMC Valve): 63-294083-02Cooling Pedestals in Loadlocks: 02-307891-01 Right, 02-307891-02 LeftThrottle Valve, WTS: 60-100802-00Loadlock ATM Gate Valve, VAT: 63-328046-00Loadlock Vacuum Gate Valve, VAT: 60-309252-00Leak check shut-off valve (attach to existing KF-40): 04-110786-00Readiness Kit (If ordered as a single Altus): NAMini Environment AWC: InstalledTransfer Module AWC (LED), [SENSOR XMITTER/SNS RECIEVER]: 03-257256-00\03-257257-00IMM Ready (IMM Mount, cabling, 17" UI, Traverser, etc): NO Software/ControlsModule Controller Type: 02-321865-00 System Controller Type: 61-311719-00System Software (Proteus): 2.653 B24System Software (QNX): 5.83 B22WTS IOC: Firmware0: HDESIOC/1.3091: N/AE84/AWC: HDESIOC/1.407Altus IOC: Firmware0: ESIOC Firmware 1.3091: ESIOC Firmware 1.3092: ESIOC Firmware 1.309Chase UI Computer: 04-346723-00Windows Version: Windows 2000 Process Chamber ConfigurationShower Heads: 16-289070-00Pedestal Position #1-#4 (ASSY, PED,300MM WCVD,PREHEAT): 16-341152-00MOER Rings 2.25mm: 02-344085-02Remote Plasma Clean(Generator, 4L, Astron): 27-261291-00Indexer Plate, HUB: 15-100082-00Indexer Plate, Upper Assembly: 15-046309-00Spindle Assembly: 02-347420-00IR Endpoint Detector, Kit: 27-304149-00Leak Check Shutoff Valve for Process Module: 60-268274-00ASSY,HOLDER,CARRIER RING,300MM,C3 ALTUS: 02-332440-00Throttle Valve MKS (Pressure Control Valve): 60-174047-00Throttle Valve MKS (Controller/Firmware): 27-325180-00Gate Valve, L-Motion, SMC: 63-294083-02KIT,SYMM FORELINE & EXHAUST,C3ALT: 04-363404-00 Gas Box Configuration:Micron Special: All Digital MFC with Gas Interface: B2H6 PA type , others are PI typeALD valves: ALD ValvesSlot: GasA & B Manifold: 3: PI-98 H2 / 30 SLM4: PI-98 Ar / 20 SLMI: PI-98 NF3 / 5 SLMD Manifold: 1: PI-98 Ar / 5 SLM2: PI-98 SiH4 /500 SCCMN: FC-PA7800C B2H6 /500 SCCMH Manifold: D: PI-98 Ar/20 SLMW Manifold: 5: PI-98 WF6/500 SCCMC Manifold: 8: PI-98 Ar/10 SLM9: PI-98 H2 / 30 SLMJ Manifold: E: PI-98 WF6/500 SCCMK Manifold: G: PI-98 SiH4 /500 SCCMF: PI-98 Ar/5 SLMX: FC-PA7800C B2H6 /750 SCCMAr Carrier Manifold: C: PI-98 Ar / 20 SLMM: PI-98 Ar / 20 SLMM Manifold: J: PI-98 WF6/500 SCCMN Manifold: K: PI-98 WF6/500 SCCMF Manifold: P: PI-98 Ar / 20 SLM BaratronAltus, CAP MANOMETER,HEATED 100 TORR: 27-10340-00Altus, CAP MANOMETER,HEATED 10 TOR: 27-10343-00Altus, Backside, CAP MANOMETER,HEATED 100 TORR: 27-10340-00WTS, Loadlock, MANOMETER,100T,MKS,750B,DSUB: 27-126439-00WTS, TM, CAP MANOMETER,HEATED 100 TORR: 27-10340-00 SUPPORTING REMOTE UNITSOne Process Pump per process chamber, will be provided by ordering Fab: IH1800SCOne Pedestal pump per process chamber, will be provided by ordering Fab: ADS 1202HOne WF6 divert pump per system, will be provided by ordering Fab: divert to process pumpOne sih4/b2h6 divert pump per system, will be provided by ordering Fab: divert to pedestal pumpOne TM pump per system, will be provided by ordering Fab: ADS 602LMOne LL pump per system, will be provided by ordering Fab: ADS 602LMheated foreline to pump: heated exhaust to guardian: installed but turned offOne LL pump per system, will be provided by ordering Fab: heated foreline to pump: NAheated exhaust to guardian: Damage/Missing parts list Please inspect tool to reconfirmDry pumps and customer provided items not included on salesOEM 모델 설명
Novellus introduced the Concept Two-Dual ALTUS tungsten deposition system in 1994. The Dual ALTUS is designed with a dual-chamber configuration that delivers the throughput power to dramatically lower the cost of tungsten deposition. It is considered the best solution in the industry for very high volume 200mm wafer fabs producing state-of-the-art 0.35um semiconductor devices.문서
문서 없음
LAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" DUAL ALTUS
검증됨
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
14754
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
LAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" DUAL ALTUS
카테고리
MOCVD
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
14754
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Process: LRW From original tool PO, please inspect to verify Process: 4200-60 CONTACT W DEPSoftware Version: 5.86B150P2System Power Rating : 208 AC 3-PhaseLoading Configuration: 3load port(Brooks) Chm Position 1: C3 ALTUS CHA- Chemicals / Gases Used Ar/SiH4/H2/WF6/NF3/B2H6 Chm Position 2: C3 ALTUS CHB-Chemicals / Gases Used Ar/SiH4/H2/WF6/NF3/B2H6 Facility & InterfaceAltus Module Locations: DualWTS(backbone) Facilities Connection Configuration: Bottom Facilities InstallationRemote Interconnect Cables: 75 feet4 Color Flush Mount Signal Tower: 34-291897-04Factory Automation Interface (Over Head Transport), [E84 AMHS Protocal]: E84 controller 02-321482-00 /E84 cable 03-160683-00WTS Frame: 3 FOUP, IMM, F472 FOUP or 3 FOUP Front End Interface: 3 FOUPFixload FOUP RF ID Reader: READER,RFID,OMRON V640-HS61 27-327806-00Fixload Firmware: Rev 2.9Remote Back End User Interface (Ergotron): 04-346723-00Primary Front End User Interface Position: RightModular Power Distribution, [MPD,DUAL, ALTUS,C3PDP]: 01-296434-03 Front End (backbone)ATM Robot Kit (Traverser, Robot, Controller), [Reliance]: Traverser 02-320123-00/Robot 02-343723-00/Controller 02-343877-00ATM Robot Firmware (for friction end effector): 1.47ATM Robot End Effector (Friction Type): 15-360099-01Transfer Module Robot With Leapfrong Armset, [Mag7]: DRIVE UNIT 27-355276-00/Arm set 63-263892-00Transfer Module to Chamber Valve (SMC Valve): 63-294083-02Cooling Pedestals in Loadlocks: 02-307891-01 Right, 02-307891-02 LeftThrottle Valve, WTS: 60-100802-00Loadlock ATM Gate Valve, VAT: 63-328046-00Loadlock Vacuum Gate Valve, VAT: 60-309252-00Leak check shut-off valve (attach to existing KF-40): 04-110786-00Readiness Kit (If ordered as a single Altus): NAMini Environment AWC: InstalledTransfer Module AWC (LED), [SENSOR XMITTER/SNS RECIEVER]: 03-257256-00\03-257257-00IMM Ready (IMM Mount, cabling, 17" UI, Traverser, etc): NO Software/ControlsModule Controller Type: 02-321865-00 System Controller Type: 61-311719-00System Software (Proteus): 2.653 B24System Software (QNX): 5.83 B22WTS IOC: Firmware0: HDESIOC/1.3091: N/AE84/AWC: HDESIOC/1.407Altus IOC: Firmware0: ESIOC Firmware 1.3091: ESIOC Firmware 1.3092: ESIOC Firmware 1.309Chase UI Computer: 04-346723-00Windows Version: Windows 2000 Process Chamber ConfigurationShower Heads: 16-289070-00Pedestal Position #1-#4 (ASSY, PED,300MM WCVD,PREHEAT): 16-341152-00MOER Rings 2.25mm: 02-344085-02Remote Plasma Clean(Generator, 4L, Astron): 27-261291-00Indexer Plate, HUB: 15-100082-00Indexer Plate, Upper Assembly: 15-046309-00Spindle Assembly: 02-347420-00IR Endpoint Detector, Kit: 27-304149-00Leak Check Shutoff Valve for Process Module: 60-268274-00ASSY,HOLDER,CARRIER RING,300MM,C3 ALTUS: 02-332440-00Throttle Valve MKS (Pressure Control Valve): 60-174047-00Throttle Valve MKS (Controller/Firmware): 27-325180-00Gate Valve, L-Motion, SMC: 63-294083-02KIT,SYMM FORELINE & EXHAUST,C3ALT: 04-363404-00 Gas Box Configuration:Micron Special: All Digital MFC with Gas Interface: B2H6 PA type , others are PI typeALD valves: ALD ValvesSlot: GasA & B Manifold: 3: PI-98 H2 / 30 SLM4: PI-98 Ar / 20 SLMI: PI-98 NF3 / 5 SLMD Manifold: 1: PI-98 Ar / 5 SLM2: PI-98 SiH4 /500 SCCMN: FC-PA7800C B2H6 /500 SCCMH Manifold: D: PI-98 Ar/20 SLMW Manifold: 5: PI-98 WF6/500 SCCMC Manifold: 8: PI-98 Ar/10 SLM9: PI-98 H2 / 30 SLMJ Manifold: E: PI-98 WF6/500 SCCMK Manifold: G: PI-98 SiH4 /500 SCCMF: PI-98 Ar/5 SLMX: FC-PA7800C B2H6 /750 SCCMAr Carrier Manifold: C: PI-98 Ar / 20 SLMM: PI-98 Ar / 20 SLMM Manifold: J: PI-98 WF6/500 SCCMN Manifold: K: PI-98 WF6/500 SCCMF Manifold: P: PI-98 Ar / 20 SLM BaratronAltus, CAP MANOMETER,HEATED 100 TORR: 27-10340-00Altus, CAP MANOMETER,HEATED 10 TOR: 27-10343-00Altus, Backside, CAP MANOMETER,HEATED 100 TORR: 27-10340-00WTS, Loadlock, MANOMETER,100T,MKS,750B,DSUB: 27-126439-00WTS, TM, CAP MANOMETER,HEATED 100 TORR: 27-10340-00 SUPPORTING REMOTE UNITSOne Process Pump per process chamber, will be provided by ordering Fab: IH1800SCOne Pedestal pump per process chamber, will be provided by ordering Fab: ADS 1202HOne WF6 divert pump per system, will be provided by ordering Fab: divert to process pumpOne sih4/b2h6 divert pump per system, will be provided by ordering Fab: divert to pedestal pumpOne TM pump per system, will be provided by ordering Fab: ADS 602LMOne LL pump per system, will be provided by ordering Fab: ADS 602LMheated foreline to pump: heated exhaust to guardian: installed but turned offOne LL pump per system, will be provided by ordering Fab: heated foreline to pump: NAheated exhaust to guardian: Damage/Missing parts list Please inspect tool to reconfirmDry pumps and customer provided items not included on salesOEM 모델 설명
Novellus introduced the Concept Two-Dual ALTUS tungsten deposition system in 1994. The Dual ALTUS is designed with a dual-chamber configuration that delivers the throughput power to dramatically lower the cost of tungsten deposition. It is considered the best solution in the industry for very high volume 200mm wafer fabs producing state-of-the-art 0.35um semiconductor devices.문서
문서 없음
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