설명
설명 없음환경 설정
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEM 모델 설명
미제공문서
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DESPATCH
LCB
검증됨
카테고리
Oven
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
15266
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
DESPATCH
LCB
검증됨
카테고리
Oven
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
15266
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEM 모델 설명
미제공문서
문서 없음
유사 등재물
모두 보기유사 등재물 없음