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PRODUCER DARC 193
카테고리
PECVD개요
Widely used in traditional gate, polysilicon and aluminum interconnect lithography applications, DARC 193 is ideal for dual damascene interconnect schemes with its excellent adhesion to low-k dielectric films.
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
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