설명
Used. Just taken offline in 2021/07 and not able to run the equipment now. If there are any questions or you need more info, please contact us.환경 설정
1. Chamber: Aluminum, 600(ID) x 138(H)mm, chamber lid opening/closing by manual 2. Electrode: Parallel plate, cathode coupling electrodes 3. Substrate Heating: Resistive heater, Max. 400℃, PID controlled 4. Substrate Holder: 5 x Φ6", Aluminum carrier. (or 13 x 4" wafer) 5. RF Power: AE Cesar, 13.56MHz, Max. 1,000W, all solid state. 6. Gas Inlet Lines: 2 Mass Flow Controllers with metal sealed and bypass lines for 10%-(SiH4 / N2) and NH3. 4 Mass Flow Controllers for N2O, N2, CF4 and O2.OEM 모델 설명
미제공문서
문서 없음
CELLO
AEGIS-60
검증됨
카테고리
Photolithography
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
47750
웨이퍼 사이즈:
알 수 없음
빈티지:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기유사 등재물 없음
CELLO
AEGIS-60
카테고리
Photolithography
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
47750
웨이퍼 사이즈:
알 수 없음
빈티지:
2014
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Used. Just taken offline in 2021/07 and not able to run the equipment now. If there are any questions or you need more info, please contact us.환경 설정
1. Chamber: Aluminum, 600(ID) x 138(H)mm, chamber lid opening/closing by manual 2. Electrode: Parallel plate, cathode coupling electrodes 3. Substrate Heating: Resistive heater, Max. 400℃, PID controlled 4. Substrate Holder: 5 x Φ6", Aluminum carrier. (or 13 x 4" wafer) 5. RF Power: AE Cesar, 13.56MHz, Max. 1,000W, all solid state. 6. Gas Inlet Lines: 2 Mass Flow Controllers with metal sealed and bypass lines for 10%-(SiH4 / N2) and NH3. 4 Mass Flow Controllers for N2O, N2, CF4 and O2.OEM 모델 설명
미제공문서
문서 없음
유사 등재물
모두 보기유사 등재물 없음