설명
설명 없음환경 설정
Frame is a AMAT Centura II Hybrid with 3 process chambers CENTURA 5200 IPS and one EMAX process chamber.OEM 모델 설명
Etch system delivers high-productivity silicon, metal, and dielectric etch. The Centura and Centura AP mainframe single-wafer, multi-chamber architectures enable integrated, sequential wafer processing in up to four process chambers for 150mm, 200mm, and 300mm wafers. For 150/200mm wafers, Applied Centura DPS® DTM system employs advanced deep reactive ion etch (DRIE) for a range of materials to precisely control etch wall smoothness and trench profile, while delivering high aspect ratio capability and achieving high throughput. Applied Centura DPS Plus is the industry standard for metal etch processes.문서
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APPLIED MATERIALS (AMAT)
CENTURA 5200 IPS
검증됨
카테고리
Plasma Etch
마지막 검증일: 18일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
103686
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기APPLIED MATERIALS (AMAT)
CENTURA 5200 IPS
카테고리
Plasma Etch
마지막 검증일: 18일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
103686
웨이퍼 사이즈:
알 수 없음
빈티지:
2002
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음환경 설정
Frame is a AMAT Centura II Hybrid with 3 process chambers CENTURA 5200 IPS and one EMAX process chamber.OEM 모델 설명
Etch system delivers high-productivity silicon, metal, and dielectric etch. The Centura and Centura AP mainframe single-wafer, multi-chamber architectures enable integrated, sequential wafer processing in up to four process chambers for 150mm, 200mm, and 300mm wafers. For 150/200mm wafers, Applied Centura DPS® DTM system employs advanced deep reactive ion etch (DRIE) for a range of materials to precisely control etch wall smoothness and trench profile, while delivering high aspect ratio capability and achieving high throughput. Applied Centura DPS Plus is the industry standard for metal etch processes.문서
문서 없음