설명
ICP double Chmbaer환경 설정
Process chamber(ICP) X 2 Slit door X 2 Heater block X 2 Lift Pin X 2 Top plate X 2 Robot X 1 Shuttle X 1 Cassette nest X 1 Shuttle dump X 1 Loadlock X 1 Cooling cahmebr X 1 Operator Box X 1 Temp panel X 2 Gas panel X 2 Gas box X 2 Cassdoor X 1 ARM X 1 Paddle X 2 DC BOX X 1 AC BOX X 1OEM 모델 설명
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.문서
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
102019
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm
HDD / Software:
Yes
Pumps:
NO
Process:
STRIP
Plasma Gas:
CF4,H2N2,O2,N2
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
MATTSON
ASPEN II
카테고리
Dry / Plasma Etch
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
102019
웨이퍼 사이즈:
4"/100mm, 6"/150mm, 8"/200mm
HDD / Software:
Yes
Pumps:
NO
Process:
STRIP
Plasma Gas:
CF4,H2N2,O2,N2
빈티지:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available