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설명
Temperature Monitoring환경 설정
환경 설정 없음OEM 모델 설명
The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C문서
문서 없음
KLA
1530
카테고리
Probers
마지막 검증일: 60일 이상 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
91949
웨이퍼 사이즈:
8"/200mm
빈티지:
알 수 없음
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설명
Temperature Monitoring환경 설정
환경 설정 없음OEM 모델 설명
The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C문서
문서 없음