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KLA 1530
    설명
    Temperature Monitoring
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C
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    KLA

    1530

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    Probers

    마지막 검증일: 9일 전

    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    91949


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음

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    유사 등재물
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    KLA 1530

    KLA

    1530

    Probers
    빈티지: 0조건: 중고
    마지막 검증일9일 전

    KLA

    1530

    verified-listing-icon
    검증됨
    카테고리
    Probers
    마지막 검증일: 9일 전
    listing-photo-0b4db008aabc419ab706d45753be46c9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    주요 품목 세부 정보

    조건:

    Used


    작동 상태:

    알 수 없음


    제품 ID:

    91949


    웨이퍼 사이즈:

    8"/200mm


    빈티지:

    알 수 없음


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    설명
    Temperature Monitoring
    환경 설정
    환경 설정 없음
    OEM 모델 설명
    The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C
    문서

    문서 없음

    유사 등재물
    모두 보기
    KLA 1530

    KLA

    1530

    Probers빈티지: 0조건: 중고마지막 검증일: 9일 전