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APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
  • APPLIED MATERIALS (AMAT) ENDURA 5500
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.
문서

문서 없음

카테고리
PVD / Sputtering

마지막 검증일: 60일 이상 전

주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

75368


웨이퍼 사이즈:

6"/150mm


빈티지:

2001


Have Additional Questions?
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Transaction Insured by Moov
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APPLIED MATERIALS (AMAT)

ENDURA 5500

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검증됨
카테고리
PVD / Sputtering
마지막 검증일: 60일 이상 전
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주요 품목 세부 정보

조건:

Used


작동 상태:

알 수 없음


제품 ID:

75368


웨이퍼 사이즈:

6"/150mm


빈티지:

2001


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
설명 없음
환경 설정
환경 설정 없음
OEM 모델 설명
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.
문서

문서 없음

유사 등재물
모두 보기