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ATC 1800 T UHV
카테고리
PVD / Sputtering개요
ATC 1800 T UHV. Accommodates up to (4) Radak Furnaces and a 4cm K&R gridded ion source for pre-cleaning and ion assisted thermal deposition. The sources include individual QCM isolation tubes to allow controlled co-deposition and an 850°C substrate heater.
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
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