We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 더 알아보기
ATC-H-2020
카테고리
PVD / Sputtering개요
For coating substrates up to 300mm in diameter, this system accommodates up to (4) 4” sputtering sources simultaneously using (2) sources at different angles to uniformly coat 300mm Ø area. This tool also includes a broad beam End Hall ion source for substrate pre-clean and sample preparation.
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
- 제품을 찾을 수 없음