System configuration: Tray transport method (Load lock is option)
Substrate size: φ150mm maximum (Have it of load lock;greatest φ100mm)
Cathode: φ2" cathode ×3
Operation method: Auto pumping operation, manual transport/deposit operation
Footprint: W1800mm×D1100mm×H1550mm (standard specification)

CANON acquired ANELVA and became CANON ANELVA Corporation which focuses on: Vacuum thin-film deposition and processing equipment, semiconductor device manufacturing equipment, storage device manufacturing equipment, equipment for electronic device manufacturing and for R&D, maintenance service, and vacuum components.


EB1000

카테고리

개요

활성 등재물

서비스

상위 등재물

Moov에 등재하고 즉시 완벽한 구매자를 찾으십시오.