EB1100
카테고리
PVD / Sputtering개요
System configuration: Load lock type tray transport method Substrate size: φ200mm maximum Cathode: φ4" cathode ×3 (Option: φ12.5" cathode ×1, φ4" cathode ×4) Operation method: Fully automated (pumping, transport, deposition)
활성 등재물
0
서비스
검사, 보험, 감정, 물류
상위 등재물
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